TLDR Tech / News
ASML begins development of next-generation Hyper NA lithography tool
ASML has initiated a decade-long project to create the Hyper NA lithography system, a 5nm tool that will follow its current high NA equipment. According to a joint paper with optics partner Zeiss, Hyper NA will boost the numerical aperture from 0.55 to at least 0.75, enabling the printing of features over 33% smaller than those produced by high NA tools. The projected cost for this system is $724 million, and it will utilize the existing 13.5nm tin-plasma light source and mask infrastructure.
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